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Title: Stoichiometry control of complex oxides by sequential pulsed-laser deposition from binary-oxide targets

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4916948· OSTI ID:1265436
 [1];  [2];  [3];  [3];  [4];  [4]
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science & Technology Division; Martin Luther Univ. Halle-Wittenberg, Halle, (Germany). Institute for Physics
  2. Martin Luther Univ. Halle-Wittenberg, Halle, (Germany). Institute for Physics
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science & Technology Division
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS)

In this paper, to have precise atomic layer control over interfaces, we examine the growth of complex oxides through the sequential deposition from binary targets by pulsed laser deposition. In situ reflection high-energy electron diffraction (RHEED) is used to control the growth and achieve films with excellent structural quality. The growth from binary oxide targets is fundamentally different from single target growth modes and shows more similarities to shuttered growth by molecular beam epitaxy. The RHEED intensity oscillations of non-stoichiometric growth are consistent with a model of island growth and accumulation of excess material on the surface that can be utilized to determine the correct stoichiometry for growth. Correct monolayer doses can be determined through an envelope frequency in the RHEED intensity oscillations. In order to demonstrate the ability of this growth technique to create complex heterostructures, the artificial n = 2 and 3 Sr n +1Ti n O3 n +1 Ruddlesden-Popper phases are grown with good long-range order. Finally, this method enables the precise unit-cell level control over the structure of perovskite-type oxides, and thus the growth of complex materials with improved structural quality and electronic functionality.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Contributing Organization:
Martin Luther Univ. Halle-Wittenberg, Halle (Germany)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1265436
Alternate ID(s):
OSTI ID: 1286706
Journal Information:
Applied Physics Letters, Vol. 106, Issue 13; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 9 works
Citation information provided by
Web of Science

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Cited By (6)

Constructing oxide interfaces and heterostructures by atomic layer-by-layer laser molecular beam epitaxy journal February 2017
Experimental setup combining in situ hard X-ray photoelectron spectroscopy and real-time surface X-ray diffraction for characterizing atomic and electronic structure evolution during complex oxide heterostructure growth journal September 2019
Structural properties of ultrathin SrO film deposited on SrTiO 3 journal April 2019
Physics of SrTiO 3 -based heterostructures and nanostructures: a review journal February 2018
Structural properties of ultrathin SrO film deposited on SrTiO3 text January 2020
Physics of SrTiO$_3$-based heterostructures and nanostructures: a review text January 2017