An industrial-scale plasma source ion implantation facility
- Los Alamos National Lab., NM (United States); and others
Plasma source ion implantation (PSII) is a non-line-of-sight method of surface modification in which a target is immersed in a plasma and repetitively biased to high, negative voltage. Previously reported PSII experiments have demonstrated improvements in surface hardness, and wear and corrosion resistances with acceptable surface uniformity on a small scale (in volumes less that 1 m{sup 3}). The authors have designed and are constructing a PSII facility encompassing a 1.5m diameter, 5m long, cylindrical vacuum chamber and a pulse modulator capable of dose rates an order of magnitude larger than previous work. This presentation will concentrate on the experimental facility and its associated diagnostic, the plasma source, the pulse modulator design, the response of the plasma to high pulse rates, and the required x-ray shielding.
- OSTI ID:
- 127955
- Report Number(s):
- CONF-920376--
- Journal Information:
- Bulletin of the American Physical Society, Journal Name: Bulletin of the American Physical Society Journal Issue: 9 Vol. 37; ISSN 0003-0503; ISSN BAPSA6
- Country of Publication:
- United States
- Language:
- English
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