The Chemical Exhaust Hazards of Dichlorosilane Deposits Determined with FT-ICR Mass Spectrometry
Journal Article
·
· IEEE Transactions on Semiconductor Manufacturing
OSTI ID:12690
Flammable deposits have been analyzed from the exhaust systems of tools employing dichlorosilane (DCS) as a processing gas. Exact mass determinations with a high-resolution Fourier-transform ion-cyclotron resonance (FT-ICR) mass spectrometer allowed the identification of various polysiloxane species present in such an exhaust flow. Ion-molecule reactions indicate the preferred reaction pathway of siloxane formation is through HCl loss, leading to the highly reactive polysiloxane that was detected in the flammable deposits.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 12690
- Report Number(s):
- SAND99-2563J; TRN: AH200120%%395
- Journal Information:
- IEEE Transactions on Semiconductor Manufacturing, Other Information: Submitted to IEEE Transactions on Semiconductor Manufacturing; PBD: 1 Oct 1999
- Country of Publication:
- United States
- Language:
- English
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