Environmentally benign polymer synthesis: Polysilane photoresists
- Stanford Univ., CA (United States)
- Sandia National Lab., Albuquerque, NM (United States); and others
Polysilanes have been investigated as photoresists, but practical and environmental concerns have limited their application. We have developed new synthetic strategies for the synthesis of water-soluble polysilanes. Catalytic dehydropolymerization of phenylsilanes produces polyphenylsilanes. Free-radical hydrosilylation of polyphenylsilane with a variety of olefins, aldehydes and ketones yields polysilanes functionalized with hydroxy, carboxy and amino substituents. These synthetic routes are far more efficient than conventional strategies for polysilane synthesis involving Wurtz coupling of dichlorosilanes in the presence of Na metal. In addition, these polymers are soluble in alcohols and water. These new materials are being investigated as self-developing and aqueous-developing photoresists; for printed circuit board applications.
- OSTI ID:
- 126736
- Report Number(s):
- CONF-950402-; TRN: 95:006086-0758
- Resource Relation:
- Conference: 209. American Chemical Society (ACS) national meeting, Anaheim, CA (United States), 2-6 Apr 1995; Other Information: PBD: 1995; Related Information: Is Part Of 209th ACS national meeting; PB: 2088 p.
- Country of Publication:
- United States
- Language:
- English
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