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Atomistic structures of nano-engineered SiC and radiation-induced amorphization resistance

Journal Article · · Journal of Nuclear Materials
 [1];  [1];  [2];  [3];  [4];  [5];  [6]
  1. Kyushu Inst. of Technology, Fukuoka (Japan). Dept. of Materials Science and Engineering
  2. Tohoku Univ., Sendai (Japan). Inst. for Materials Research
  3. Univ. of Tennessee, Knoxville, TN (United States). Materials Science and Engineering Dept.
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division; Univ. of Tennessee, Knoxville, TN (United States). Materials Science and Engineering Dept.
  5. North Carolina State Univ., Raleigh, NC (United States). Dept. of Nuclear Engineering
  6. Univ. of Tennessee, Knoxville, TN (United States). Materials Science and Engineering Dept.; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division
In this paper, nano-engineered 3C–SiC thin films, which possess columnar structures with high-density stacking faults and twins, were irradiated with 2 MeV Si ions at cryogenic and room temperatures. From cross-sectional transmission electron microscopy observations in combination with Monte Carlo simulations based on the Stopping and Range of Ions in Matter code, it was found that their amorphization resistance is six times greater than bulk crystalline SiC at room temperature. High-angle bright-field images taken by spherical aberration corrected scanning transmission electron microscopy revealed that the distortion of atomic configurations is localized near the stacking faults. Finally, the resultant strain field probably contributes to the enhancement of radiation tolerance of this material.
Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
Ministry of Education, Sports, Science, and Technology (Japan); USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1265572
Alternate ID(s):
OSTI ID: 22589922
OSTI ID: 1251994
Journal Information:
Journal of Nuclear Materials, Journal Name: Journal of Nuclear Materials Vol. 465; ISSN 0022-3115
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English

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Cited By (1)

Raman study of amorphization in nanocrystalline 3C–SiC irradiated with C + and He + ions journal May 2019

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