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Effect of interfacial structures on spin dependent tunneling in epitaxial L10-FePt/MgO/FePt perpendicular magnetic tunnel junctions

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4913265· OSTI ID:1265531
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [2];  [2];  [3];  [3];  [3];  [4]
  1. Chinese Academy of Sciences (CAS), Beijing (China). State Key Lab. of Magnetism. Beijing National Lab. for Condensed Matter Physics. Inst. of Physics
  2. Univ. of Oxford (United Kingdom). Clarendon Lab. Dept. of Physics
  3. Ben-Gurion Univ. of the Negev, Beer-Sheva (Israel). Dept. of Materials Engineering. Ilse Katz Inst. for Nanoscale Science and Technology
  4. Univ. of Florida, Gainesville, FL (United States). Dept. of Physics. Quantum Theory Project; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences. Computer Science and Mathematics Division
In this study, epitaxial FePt(001)/MgO/FePt magnetic tunnel junctions with L10-FePt electrodes showing perpendicular magnetic anisotropy were fabricated by molecular beam epitaxial growth. Tunnel magnetoresistance ratios of 21% and 53% were obtained at 300 K and 10 K, respectively. Our previous work, based on transmission electron microscopy, confirmed a semi-coherent interfacial structure with atomic steps (Kohn et al., APL 102, 062403 (2013)). Here, we show by x-ray photoemission spectroscopy and first-principles calculation that the bottom FePt/MgO interface is either Pt-terminated for regular growth or when an Fe layer is inserted at the interface, it is chemically bonded to O. Finally, both these structures have a dominant role in spin dependent tunneling across the MgO barrier resulting in a decrease of the tunneling magnetoresistance ratio compared with previous predictions.
Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE
Contributing Organization:
Ben-Gurion Univ. of the Negev, Beer-Sheva (Israel); Chinese Academy of Sciences (CAS), Beijing (China)
OSTI ID:
1265531
Alternate ID(s):
OSTI ID: 22413156
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 117; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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Cited By (3)

Influence of HfO 2 interlayers on magnetocrystalline anisotropy in Fe |MgO |Fe magnetic tunnel junction: First-principles investigation journal June 2019
Tunnel magnetoresistance in ultrathin L1 0 MnGa/MgO perpendicular magnetic tunnel junctions journal May 2018
[Co/Ni] multilayers with robust post-annealing performance for spintronics device applications journal October 2018

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