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Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

Journal Article · · Journal of Crystal Growth
 [1];  [2];  [3];  [1];  [1];  [3];  [4]
  1. The Ohio State Univ., Columbus, OH (United States)
  2. Univ. of California, Riverside, CA (United States)
  3. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  4. The Ohio State Univ., Columbus, OH (United States); Univ. of California, Riverside, CA (United States)
Here, we report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 Å. Moreover, transport measurements of exfoliated graphene, after SrO deposition, show a strong dependence between the Dirac point and Sr oxidation. As a result, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.
Research Organization:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE; USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC04-94AL85000
OSTI ID:
1259540
Alternate ID(s):
OSTI ID: 1359323
Report Number(s):
SAND2015--10742J; PII: S0022024816302032
Journal Information:
Journal of Crystal Growth, Journal Name: Journal of Crystal Growth Journal Issue: C Vol. 447; ISSN 0022-0248
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English

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