Large-Area Growth of Turbostratic Graphene on Ni(111) via Physical Vapor Deposition

Garlow, Joseph A.; Barrett, Lawrence K.; Wu, Lijun; Kisslinger, Kim; Zhu, Yimei; Pulecio, Javier F.

doi:10.1038/srep19804

Large-Area Growth of Turbostratic Graphene on Ni(111) via Physical Vapor Deposition

Journal Article · Fri Jan 29 00:00:00 EST 2016 · Scientific Reports

DOI:https://doi.org/10.1038/srep19804· OSTI ID:1259265

Garlow, Joseph A. ^[1]; Barrett, Lawrence K. ^[2]; Wu, Lijun ^[3]; Kisslinger, Kim ^[3]; Zhu, Yimei ^[1]; Pulecio, Javier F. ^[3]

Brookhaven National Lab. (BNL), Upton, NY (United States); Stony Brook Univ., NY (United States)
Boston Univ., MA (United States)
Brookhaven National Lab. (BNL), Upton, NY (United States)

Single-layer graphene has demonstrated remarkable electronic properties that are strongly influenced by interfacial bonding and break down for the lowest energy configuration of stacked graphene layers (AB Bernal). Multilayer graphene with relative rotations between carbon layers, known as turbostratic graphene, can effectively decouple the electronic states of adjacent layers, preserving properties similar to that of SLG. While the growth of AB Bernal graphene through chemical vapor deposition has been widely reported, we investigate the growth of turbostratic graphene on heteroepitaxial Ni(111) thin films utilizing physical vapor deposition. By varying the carbon deposition temperature between 800–1100°C, we report an increase in the graphene quality concomitant with a transition in the size of uniform thickness graphene, ranging from nanocrystallites to thousands of square microns. Combination Raman modes of as-grown graphene within the frequency range of 1650 cm^₋1 to 2300 cm^₋1, along with features of the Raman 2D mode, were employed as signatures of turbostratic graphene. Bilayer and multilayer graphene were directly identified from areas that exhibited Raman characteristics of turbostratic graphene using high-resolution TEM imaging. Lastly, Raman maps of the pertinent modes reveal large regions of turbostratic graphene on Ni(111) thin films at a deposition temperature of 1100°C.

View Accepted Manuscript (DOE)

Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

Grant/Contract Number:: AC02-98CH10886; SC0012704

OSTI ID:: 1259265

Alternate ID(s):: OSTI ID: 1335423

Report Number(s):: BNL--112043-2016-JA; srep19804

Journal Information:: Scientific Reports, Journal Name: Scientific Reports Vol. 6; ISSN 2045-2322

Publisher:: Nature Publishing GroupCopyright Statement

Country of Publication:: United States

Language:: English

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