Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors
Journal Article
·
· ACS Applied Materials and Interfaces
- BNL
Abstract not provided
- Research Organization:
- Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
- Sponsoring Organization:
- NSFU.S. AIR FORCE- OFFICE OF SCIENTIFIC RESEARCH
- OSTI ID:
- 1245861
- Journal Information:
- ACS Applied Materials and Interfaces, Journal Name: ACS Applied Materials and Interfaces Journal Issue: 12 Vol. 8; ISSN 1944-8244
- Country of Publication:
- United States
- Language:
- ENGLISH
Similar Records
Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors
Directed self-assembly of block copolymers for high breakdown strength polymer film capacitors
Template–polymer commensurability and directed self-assembly block copolymer lithography
Journal Article
·
Thu Mar 03 23:00:00 EST 2016
· ACS Applied Materials and Interfaces
·
OSTI ID:1354333
Directed self-assembly of block copolymers for high breakdown strength polymer film capacitors
Journal Article
·
Thu Mar 03 19:00:00 EST 2016
· ACS Applied Materials and Interfaces
·
OSTI ID:1328368
Template–polymer commensurability and directed self-assembly block copolymer lithography
Journal Article
·
Wed Apr 01 00:00:00 EDT 2015
· Journal of Polymer Science. Part B, Polymer Physics
·
OSTI ID:1177440