Template–polymer commensurability and directed self-assembly block copolymer lithography

Journal Article · Wed Apr 01 04:00:00 EDT 2015 · Journal of Polymer Science. Part B, Polymer Physics

DOI:https://doi.org/10.1002/polb.23675· OSTI ID:1177440

Sunday, Daniel F. ^[1]; Ashley, Elizabeth ^[2]; Wan, Lei ^[3]; Patel, Kanaiyalal C. ^[3]; Ruiz, Ricardo ^[3]; Kline, R. Joseph ^[1]

National Institute of Standards and Technology, Gaithersburg, MD (United States)
Univ. of Maryland, College Park, MD (United States)
San Jose Research Center, San Jose, CA (United States). A Western Digital Company.

Abstract not provided

Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS).

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

Journal Information:: Journal of Polymer Science. Part B, Polymer Physics, Journal Name: Journal of Polymer Science. Part B, Polymer Physics Journal Issue: 8 Vol. 53; ISSN 0887-6266

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SAXS
block copolymers
lithography
self-assembly