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Electron-induced single event upsets in 28 nm and 45 nm bulk SRAMs

Journal Article · · IEEE Transactions on Nuclear Science
 [1];  [1];  [1];  [1];  [1];  [1];  [2];  [3];  [3];  [4];  [1];  [5];  [5];  [1]
  1. Vanderbilt Univ., Nashville, TN (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  3. Broadcom, Irvine, CA (United States)
  4. Texas Instruments, Inc., Dallas, TX (United States)
  5. Arnold Engineering and Development Complex, Tullahoma, TN (United States)
In this study, we present experimental evidence of single electron-induced upsets in commercial 28 nm and 45 nm CMOS SRAMs from a monoenergetic electron beam. Upsets were observed in both technology nodes when the SRAM was operated in a low power state. The experimental cross section depends strongly on both bias and technology node feature size, consistent with previous work in which SRAMs were irradiated with low energy muons and protons. Accompanying simulations demonstrate that δ-rays produced by the primary electrons are responsible for the observed upsets. Additional simulations predict the on-orbit event rates for various Earth and Jovian environments for a set of sensitive volumes representative of current technology nodes. The electron contribution to the total upset rate for Earth environments is significant for critical charges as high as 0.2 fC. This value is comparable to that of sub-22 nm bulk SRAMs. Similarly, for the Jovian environment, the electron-induced upset rate is larger than the proton-induced upset rate for critical charges as high as 0.3 fC.
Research Organization:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC04-94AL85000
OSTI ID:
1237662
Report Number(s):
SAND--2015-5314J; 594551
Journal Information:
IEEE Transactions on Nuclear Science, Journal Name: IEEE Transactions on Nuclear Science Journal Issue: 6 Vol. 62; ISSN 0018-9499
Publisher:
Institute of Electrical and Electronics Engineers (IEEE)Copyright Statement
Country of Publication:
United States
Language:
English

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