Quasi-two-dimensional electron gas at the epitaxial alumina/SrTiO3 interface: Control of oxygen vacancies
Journal Article
·
· Journal of Applied Physics
- Univ. of Texas, Austin, TX (United States)
- Arizona State Univ., Tempe, AZ (United States)
- Case Western Reserve Univ., Cleveland, OH (United States)
- IBM T.J. Watson Research Center, Yorktown Heights, NY (United States)
In this paper, we report on the highly conductive layer formed at the crystalline γ-alumina/SrTiO3 interface, which is attributed to oxygen vacancies. We describe the structure of thin γ-alumina layers deposited by molecular beam epitaxy on SrTiO3 (001) at growth temperatures in the range of 400–800 °C, as determined by reflection-high-energy electron diffraction, x-ray diffraction, and high-resolution electron microscopy. In situ x-ray photoelectron spectroscopy was used to confirm the presence of the oxygen-deficient layer. Electrical characterization indicates sheet carrier densities of ~1013 cm–2 at room temperature for the sample deposited at 700 °C, with a maximum electron Hall mobility of 3100 cm2V–1s–1 at 3.2 K and room temperature mobility of 22 cm2V–1s–1. In conclusion, annealing in oxygen is found to reduce the carrier density and turn a conductive sample into an insulator.
- Research Organization:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Organization:
- Air Force Office of Scientific Research (AFOSR); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
- Grant/Contract Number:
- AC02-98CH10886
- OSTI ID:
- 1229307
- Alternate ID(s):
- OSTI ID: 22413227
- Report Number(s):
- BNL--111382-2015-JA
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 9 Vol. 117; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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