Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Brookhaven National Lab. (BNL), Upton, NY (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Univ. College London, London (United Kingdom); Research Complex at Hartwell, Oxfordshire (United Kingdom)
We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States); Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-06CH11357; SC00112704; 227711; DMR-9724294
- OSTI ID:
- 1215667
- Journal Information:
- Optics Express, Vol. 23, Issue 10; ISSN 1094-4087
- Publisher:
- Optical Society of America (OSA)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
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