High numerical aperture multilayer Laue lenses

Morgan, Andrew J.; Prasciolu, Mauro; Andrejczuk, Andrzej; Krzywinski, Jacek; Meents, Alke; Pennicard, David; Graafsma, Heinz; Barty, Anton; Bean, Richard J.; Barthelmess, Miriam; Oberthuer, Dominik; Yefanov, Oleksandr; Aquila, Andrew; Chapman, Henry N.; Bajt, Saša

doi:10.1038/srep09892

Title: High numerical aperture multilayer Laue lenses

Journal Article · Mon Jun 01 00:00:00 EDT 2015 · Scientific Reports

DOI:https://doi.org/10.1038/srep09892· OSTI ID:1208858

Morgan, Andrew J. ^[1]; Prasciolu, Mauro ^[1]; Andrejczuk, Andrzej ^[2]; Krzywinski, Jacek ^[3]; Meents, Alke ^[1]; Pennicard, David ^[1]; Graafsma, Heinz ^[1]; Barty, Anton ^[1]; Bean, Richard J. ^[1]; Barthelmess, Miriam ^[1]; Oberthuer, Dominik ^[4]; Yefanov, Oleksandr ^[1]; Aquila, Andrew ^[5]; Chapman, Henry N. ^[6]; Bajt, Saša ^[1]

Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany)
Univ. of Bialystok (Poland)
SLAC National Accelerator Lab., Menlo Park, CA (United States)
Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany); Univ. of Hamburg (Germany).
Eurpean XFEL GmbH, Hamburg (Germany)
Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany); Centre for Ultrafast Umaging, Hamburg (Germany); Univ. of Hamburg (Germany).

The ever-increasing brightness of synchrotron radiation sources demands improved X-ray optics to utilise their capability for imaging and probing biological cells, nanodevices, and functional matter on the nanometer scale with chemical sensitivity. Here we demonstrate focusing a hard X-ray beam to an 8 nm focus using a volume zone plate (also referred to as a wedged multilayer Laue lens). This lens was constructed using a new deposition technique that enabled the independent control of the angle and thickness of diffracting layers to microradian and nanometer precision, respectively. This ensured that the Bragg condition is satisfied at each point along the lens, leading to a high numerical aperture that is limited only by its extent. We developed a phase-shifting interferometric method based on ptychography to characterise the lens focus. The precision of the fabrication and characterisation demonstrated here provides the path to efficient X-ray optics for imaging at 1 nm resolution.

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Research Organization:: SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC03-76SF00515

OSTI ID:: 1208858

Journal Information:: Scientific Reports, Vol. 5; ISSN 2045-2322

Publisher:: Nature Publishing GroupCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 74 works

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