Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning

Luo, Yingdong; Montarnal, Damien; Kim, Sangwon; Shi, Weichao; Barteau, Katherine P.; Pester, Christian W.; Hustad, Phillip D.; Christianson, Matthew D.; Fredrickson, Glenn H.; Kramer, Edward J.; Hawker, Craig J.

doi:10.1021/acs.macromol.5b00518

Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning

Journal Article · Tue May 19 00:00:00 EDT 2015 · Macromolecules

DOI:https://doi.org/10.1021/acs.macromol.5b00518· OSTI ID:1186927

Luo, Yingdong ^[1]; Montarnal, Damien ^[1]; Kim, Sangwon ^[2]; Shi, Weichao ^[1]; Barteau, Katherine P. ^[1]; Pester, Christian W. ^[1]; Hustad, Phillip D. ^[3]; Christianson, Matthew D. ^[4]; Fredrickson, Glenn H. ^[1]; Kramer, Edward J. ^[1]; Hawker, Craig J. ^[1]

Univ. of California, Santa Barbara, CA (United States)
Univ. of California, Santa Barbara, CA (United States); Inha Univ., Incheon (Korea)
Dow Electronic Materials, Marlborough, MA (United States)
The Dow Chemical Company, Midland, MI (United States)

We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ~ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ~ 0.1 at 150 °C). Furthermore, performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials.

View Accepted Manuscript (DOE)

Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: NSF

OSTI ID:: 1186927

Journal Information:: Macromolecules, Journal Name: Macromolecules Journal Issue: 11 Vol. 48; ISSN 0024-9297

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: ENGLISH

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