Bi-induced band gap reduction in epitaxial InSbBi alloys
The properties of molecular beam epitaxy-grown InSb1-x Bix alloys are investigated. Rutherford backscattering spectrometry shows that the Bi content increases from 0.6% for growth at 350 °C to 2.4% at 200 °C. X-ray diffraction indicates Bi-induced lattice dilation and suggests a zinc-blende InBi lattice parameter of 6.626 Å. Scanning electron microscopy reveals surface InSbBi nanostructures on the InSbBi films for the lowest growth temperatures, Bi droplets at intermediate temperatures, and smooth surfaces for the highest temperature. The room temperature optical absorption edge was found to change from 172 meV (7.2 μm) for InSb to ~88 meV (14.1 μm) for InSb0.976Bi0.024, a reduction of ~35 meV/%Bi.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-98CH10886; AC02-05CH11231
- OSTI ID:
- 1179636
- Alternate ID(s):
- OSTI ID: 1212662; OSTI ID: 1420682
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 105 Journal Issue: 21; ISSN 0003-6951
- Publisher:
- American Institute of PhysicsCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 36 works
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