Silicon micro-mold and method for fabrication

Morales, Alfredo M.

Silicon micro-mold and method for fabrication

Patent · Tue Jan 11 04:00:00 EST 2005

OSTI ID:1175199

Morales, Alfredo M.

The present invention describes a method for rapidly fabricating a robust 3-dimensional silicon micro-mold for use in preparing complex metal micro-components. The process begins by depositing a conductive metal layer onto one surface of a silicon wafer. A thin photoresist and a standard lithographic mask are then used to transfer a trace image pattern onto the opposite surface of the wafer by exposing and developing the resist. The exposed portion of the silicon substrate is anisotropically etched through the wafer thickness down to conductive metal layer to provide an etched pattern consisting of a series of rectilinear channels and recesses in the silicon which serve as the silicon micro-mold. Microcomponents are prepared with this mold by first filling the mold channels and recesses with a metal deposit, typically by electroplating, and then removing the silicon micro-mold by chemical etching.

Research Organization:: Sandia National Laboratories (SNL-CA), Livermore, CA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC04-94AL85000

Assignee:: Sandia National Laboratories

Patent Number(s):: 6,841,339

Application Number:: 10/072,394

OSTI ID:: 1175199

Country of Publication:: United States

Language:: English

References (11)

Inexpensive, quickly producable X-ray mask for LIGA Harris, C.; Desta, Y.; Kelly, K. W. Microsystem Technologies, Vol. 5, Issue 4 https://doi.org/10.1007/s005420050162	journal	July 1999
Advanced silicon etching using high-density plasmas Bhardwaj, Jy K.; Ashraf, Huma Micromachining and Microfabrication, SPIE Proceedings https://doi.org/10.1117/12.221279	conference	September 1995
X-Ray masks for very deep X-Ray lithography Klein, J.; Guckel, H.; Siddons, D. P. Microsystem Technologies, Vol. 4, Issue 2 https://doi.org/10.1007/s005420050098	journal	February 1998
High precision, low cost mask for deep x-ray lithography Shew, B. -Y.; Cheng, Y.; Shih, W. -P. Microsystem Technologies, Vol. 4, Issue 2 https://doi.org/10.1007/s005420050097	journal	February 1998
Deep X-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics Ehrfeld, W.; Lehr, H. Radiation Physics and Chemistry, Vol. 45, Issue 3 https://doi.org/10.1016/0969-806X(93)E0007-R	journal	March 1995
Mask making for synchrotron radiation lithography Ehrfeld, W.; Glashauser, W.; Münchmeyer, D. Microelectronic Engineering, Vol. 5, Issue 1-4 https://doi.org/10.1016/0167-9317(86)90078-X	journal	December 1986
Fabrication of HARM structures by deep-X-ray lithography using graphite mask technology Coane, P.; Giasolli, R.; Ledger, S. Microsystem Technologies, Vol. 6, Issue 3 https://doi.org/10.1007/s005420050005	journal	February 2000
DEM technique: a new three-dimensional microfabrication technique for nonsilicon materials Chen, Di; Zhang, Dacheng; Ding, Guifu Design, Test, and Microfabrication of MEMS/MOEMS, SPIE Proceedings https://doi.org/10.1117/12.341181	conference	March 1999
New type X-ray mask fabricated using inductively coupled plasma deepetching Chen, D.; Lei, W.; Wang, S. Microsystem Technologies, Vol. 7, Issue 2 https://doi.org/10.1007/s005420000073	journal	May 2001
Fabrication of intermediate mask for deep x-ray lithography Sheu, T.; Chiang, M. H.; Su, S. Microsystem Technologies, Vol. 4, Issue 2 https://doi.org/10.1007/s005420050099	journal	February 1998
Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process) Becker, E. W.; Ehrfeld, W.; Hagmann, P. Microelectronic Engineering, Vol. 4, Issue 1, p. 35-56 https://doi.org/10.1016/0167-9317(86)90004-3	journal	May 1986

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