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Title: Effect of Microstructure on the Dielectric Properties of Compositionally Graded (BaSr)TiO3 Films.

Abstract

Abstract not provided.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1148224
Report Number(s):
SAND2007-2608J
Journal ID: ISSN 0021-8979; 523185
DOE Contract Number:  
DE-AC04-94AL85000
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 102; Journal Issue: 5; Related Information: Proposed for publication in Journal of Applied Physics.
Country of Publication:
United States
Language:
English

Citation Formats

Sigman, Jennifer Kate, Clem, Paul Gilbert, Nordquist, Christopher Daniel, Richardson, Jacob J., and dawley, jeff t. Effect of Microstructure on the Dielectric Properties of Compositionally Graded (BaSr)TiO3 Films.. United States: N. p., 2007. Web. doi:10.1063/1.2775922.
Sigman, Jennifer Kate, Clem, Paul Gilbert, Nordquist, Christopher Daniel, Richardson, Jacob J., & dawley, jeff t. Effect of Microstructure on the Dielectric Properties of Compositionally Graded (BaSr)TiO3 Films.. United States. doi:10.1063/1.2775922.
Sigman, Jennifer Kate, Clem, Paul Gilbert, Nordquist, Christopher Daniel, Richardson, Jacob J., and dawley, jeff t. Mon . "Effect of Microstructure on the Dielectric Properties of Compositionally Graded (BaSr)TiO3 Films.". United States. doi:10.1063/1.2775922.
@article{osti_1148224,
title = {Effect of Microstructure on the Dielectric Properties of Compositionally Graded (BaSr)TiO3 Films.},
author = {Sigman, Jennifer Kate and Clem, Paul Gilbert and Nordquist, Christopher Daniel and Richardson, Jacob J. and dawley, jeff t.},
abstractNote = {Abstract not provided.},
doi = {10.1063/1.2775922},
journal = {Journal of Applied Physics},
number = 5,
volume = 102,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2007},
month = {Mon Jan 01 00:00:00 EST 2007}
}