Reactive Sputtering of Sub-Stoichiometric Ta2Ox for Resistive Memory Applications.

Journal Article · Sun Sep 01 00:00:00 EDT 2013 · JVST-A

OSTI ID:1113068

Stevens, James E.; Lohn, Andrew; Decker, Seth; Doyle, Barney Lee; Mickel, Patrick R.; Marinella, Matthew

Abstract not provided.

• Research Organization: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 1113068
• Report Number(s): SAND2013-8170J; 476388
• Journal Information: JVST-A, Journal Name: JVST-A
• Country of Publication: United States
• Language: English