Reactive Sputtering of Sub-Stoichiometric Ta2O5-x for Resistive Memory Applications.

Journal Article · Mon Jul 01 00:00:00 EDT 2013 · JVSTA

OSTI ID:1106352

Lohn, Andrew; Mickel, Patrick R.; Doyle, Barney Lee; Marinella, Matthew; Stevens, James E.

Abstract not provided.

• Research Organization: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 1106352
• Report Number(s): SAND2013-5700J; 465473
• Journal Information: JVSTA, Journal Name: JVSTA
• Country of Publication: United States
• Language: English