Plasmonic control of near-interface exciton dynamics in defect-rich ZnO thin films

Journal Article · Sun Jan 01 04:00:00 EST 2012 · Plasmonics

OSTI ID:1069319

Lawrie, Benjamin J ^[1]; Mu, Richard ^[2]; HaglundJr, Richard F ^[3]

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1. ORNL
2. Fisk University, Nashville, TN
3. Vanderbilt University

ZnO is an attractive material for many electro-optical applications, but the control of impurities remains an issue in device fabrication. For this paper, the dynamics of defect states produced by annealing ZnO thin-films at temperatures of 400-800C were probed by band-edge pump probe spectroscopy in differential reflection and transmission. The distinction between the differential reflection and transmission spectra allowed for the analysis of ultrafast near-interface dynamics, which cannot be separated from the bulk thin film dynamics by traditional ultrafast spectroscopies. In particular, simulataneous differential reflection and transmission spectroscopy provided clear evidence that the band-edge recombination dynamics in samples annealed at 400C were absent near the ZnO/substrate interface. However, the Purcell enhancement observed in Ag/ZnO heterostructures resulted in the dramatic emergence of the band-edge recombination signal where none was previously observable due to the dominant defect luminescence. Plasmon-exciton coupling enhances band-edge exciton recombination by nearly two orders of magnitude over the defect luminescence. This indicates that the spatial range of the Purcell effect is at least twice as large as inferred from photoluminescence studies.

• Research Organization: Oak Ridge National Laboratory (ORNL)
• Sponsoring Organization: ORNL LDRD Director's R&D; ORNL work for others
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1069319
• Journal Information: Plasmonics, Journal Name: Plasmonics
• Country of Publication: United States
• Language: English