The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Conference
·
OSTI ID:1051261
Impact of Ar gas pressure (1-4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering ({lambda} = 0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
- Sponsoring Organization:
- Advanced Light Source Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 1051261
- Report Number(s):
- LBNL-5070E
- Country of Publication:
- United States
- Language:
- English
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