Fabrication and characterization of lithium manganese nickel oxide sputtered thin film cathodes for lithium-ion batteries

Journal Article · Sun Jan 01 04:00:00 EST 2012 · Journal of Power Sources

DOI:https://doi.org/10.1016/j.jpowsour.2012.03.076· OSTI ID:1039239

Baggetto, Loic ^[1]; Unocic, Raymond R ^[1]; Dudney, Nancy J ^[1]; Veith, Gabriel M ^[1]

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1. ORNL

Li-rich and stoichiometric Li1Mn1.5Ni0.5O4 (LMNO) cathode films have been prepared by magnetron sputtering. Sputtering from a Li stoichiometric target yields Li-rich films composed of spinel, layered and monoclinic phases. Films obtained from a Li deficient target are mostly made of a spinel phase and little layered material. The resulting cathode thin films have good capacity retention and very high rate capability. The reaction mechanism has been investigated by XRD and HRTEM and evidences the reversible formation of a spinel phase, as is also found for the powder samples. The film geometry enables to understand the effect of coatings (ZnO or LiPON). Coating high voltage cathodes reduces the coulombic losses but at the price of rate performance. Nonetheless, these coated sputtered electrode thin films offer a higher rate capability than other LMNO thin films obtained by other physical vapor deposition techniques.

• Research Organization: Oak Ridge National Laboratory (ORNL); High Temperature Materials Laboratory (HTML)
• Sponsoring Organization: ORNL LDRD Director's R&D
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1039239
• Journal Information: Journal of Power Sources, Journal Name: Journal of Power Sources Vol. 211; ISSN JPSODZ; ISSN 0378-7753
• Country of Publication: United States
• Language: English

Related Subjects

25 ENERGY STORAGE
36 MATERIALS SCIENCE
CAPACITY
CATHODES
COATINGS
ELECTRODES
FABRICATION
GEOMETRY
High voltage spinel cathodes
LITHIUM
MAGNETRONS
MANGANESE
NICKEL OXIDES
PERFORMANCE
PHYSICAL VAPOR DEPOSITION
PRICES
REACTION KINETICS
RETENTION
SPINELS
SPUTTERING
TARGETS
THIN FILMS
X-RAY DIFFRACTION
coatings
layered spinel composite structure
magnetron sputtering
thin films