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Title: Dielectric spectroscopy of Pb{sub 0.92}La{sub 0.08}Zr{sub 0.52}Ti{sub0.48}O{sub 3} films on hastealloy substrates with and without LaNiO{sub 3} buffer layers.

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3291127· OSTI ID:1039137

Pb{sub 0.92}La{sub 0.08}Zr{sub 0.52}Ti{sub 0.48}O{sub 3} (PLZT) films were deposited by sol-gel synthesis on Hastelloy substrates with and without a LaNiO{sub 3} buffer. The dielectric properties were measured as a function of temperature and frequency to study the cause of dielectric degradation in PLZT films directly on hastelloy substrates. These measurements indicated an increased charge carrier activity in films without a buffer layer. We propose that a region of the film closer to the substrate surface is more oxygen deficient than the bulk and is responsible for the degradation in properties rather than the presence of a low parasitic secondary-phase interfacial layer such as NiO{sub x}.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
EE
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
1039137
Report Number(s):
ANL/ES/JA-66580; JAPIAU; TRN: US201209%%199
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 2; ISSN 0021-8979
Country of Publication:
United States
Language:
ENGLISH