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Material Quality Requirements for Efficient Epitaxial Film Silicon Solar Cells

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3309751· OSTI ID:1036360
The performance of 2-..mu..m-thick crystal silicon (c-Si) solar cells grown epitaxially on heavily doped wafer substrates is quantitatively linked to absorber dislocation density. We find that such thin devices have a high tolerance to bulk impurities compared to wafer-based cells. The minority carrier diffusion length is about half the dislocation spacing and must be roughly three times theabsorber thickness for efficient carrier extraction. Together, modeling and experimental results provide design guidelines for film c-Si photovoltaic cells.
Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE Office of Solar Energy Technologies Program
DOE Contract Number:
AC36-08GO28308
OSTI ID:
1036360
Report Number(s):
NREL/JA-270-47595; MainId:49466; UUID:16b8e05f-e9d4-e411-b769-d89d67132a6d; MainAdminId:31558
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 7 Vol. 96; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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