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Controlled growth of larger heterojunction interface area for organic photosensitive devices

Patent ·
OSTI ID:1013561
An optoelectronic device and a method of fabricating a photosensitive optoelectronic device includes depositing a first organic semiconductor material on a first electrode to form a continuous first layer having protrusions, a side of the first layer opposite the first electrode having a surface area at least three times greater than an underlying lateral cross-sectional area; depositing a second organic semiconductor material directly on the first layer to form a discontinuous second layer, portions of the first layer remaining exposed; depositing a third organic semiconductor material directly on the second layer to form a discontinuous third layer, portions of at least the second layer remaining exposed; depositing a fourth organic semiconductor material on the third layer to form a continuous fourth layer, filling any exposed gaps and recesses in the first, second, and third layers; and depositing a second electrode on the fourth layer, wherein at least one of the first electrode and the second electrode is transparent, and the first and third organic semiconductor materials are both of a donor-type or an acceptor-type relative to second and fourth organic semiconductor materials, which are of the other material type.
Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE
Assignee:
The Trustees of Princeton University (Princeton, NJ); The Regents of the University of Michigan (Ann Arbor, MI)
Patent Number(s):
7,638,356
Application Number:
US Patent Application 11/483,641
OSTI ID:
1013561
Country of Publication:
United States
Language:
English

References (3)

Efficient photon harvesting at high optical intensities in ultrathin organic double-heterostructure photovoltaic diodes journal May 2000
Controlled growth of a molecular bulk heterojunction photovoltaic cell journal December 2004
Ultrathin Organic Films Grown by Organic Molecular Beam Deposition and Related Techniques journal October 1997

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