Submicrometer-Resolution Mapping of Ultraweak 355-nm Absorption in HfO2 Monolayers Using Photothermal Heterodyne Imaging
Journal Article
·
· Laser-Induced Damage in Optical Materials: 2010
OSTI ID:1004172
- Laboratory for Laser Energetics, University of Rochester, Rochester, NY
Nanosecond-pulse UV-laser-damage initiation in multilayer coatings comprised from metal oxide as a high-index component, and silica oxide as a low-index material, is strongly linked to metal oxide. The nature of the absorbing species and their physical properties remain unknown because of extremely small sizes. Previous experimental evidence provided by high-resolution mapping of damage morphology points to a few-nanometer scale of these absorbers. This work demonstrates submicrometer mapping of 355-nm absorption in HfO2 monolayers using a recently developed photothermal heterodyne imaging technique. Comparison of absorption maps with spatial distribution of UV pulsed-laser–induced damage morphology allows one to better estimate the size and densities of nanoscale absorbing defects in hafnia thin films. Possible defect-formation mechanisms are discussed.
- Research Organization:
- Laboratory for Laser Energetics, University of Rochester
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FC52-08NA28302
- OSTI ID:
- 1004172
- Report Number(s):
- DOE/NA/28302-990; 2010-62; 1972
- Journal Information:
- Laser-Induced Damage in Optical Materials: 2010, Journal Name: Laser-Induced Damage in Optical Materials: 2010 Vol. 7842
- Country of Publication:
- United States
- Language:
- English
Similar Records
Spectroscopic setup for submicrometer-resolution mapping of low-signal absorption and luminescence using photothermal heterodyne imaging and photon-counting techniques
Damage Behavior of HfO2 Monolayer Film Containing Gold Nanoparticles as Artificial Absorbing Defects
Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering
Journal Article
·
Wed May 08 20:00:00 EDT 2019
· Applied Optics
·
OSTI ID:1515832
Damage Behavior of HfO2 Monolayer Film Containing Gold Nanoparticles as Artificial Absorbing Defects
Conference
·
Tue Feb 28 23:00:00 EST 2006
· in Laser-Induced Damage in Optical Materials: 2005, edited by G. J. Exarhos, A. H. Guenther, K. L. Lewis, D. Ristau, M. J. Soileau, and C. J. Stolz (SPIE, Bellingham, WA, 2005)
·
OSTI ID:876676
Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering
Journal Article
·
Thu May 01 00:00:00 EDT 2008
· Applied Optics
·
OSTI ID:21120730