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Growth and Characterization of Sputtered BSTO/BaM Multilayers

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1853874· OSTI ID:1003095
 [1];  [1];  [1];  [1];  [2];  [3]
  1. University of South Florida, Tampa
  2. University of Central Florida, Orlando
  3. ORNL
Multilayers of Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} (BSTO) and BaFe{sub 12}O{sub 19} (BaM), with tunable permeability and permittivity are attractive systems for radio frequency and microwave applications. We have grown multilayers of BSTO and BaM using magnetron sputtering on Al{sub 2}O{sub 3} substrates. Film growth conditions such as sputtering parameters were optimized to obtain high quality multilayers. X-ray diffraction established that both BSTO and BaM were formed and cross-sectional SEM studies showed sharp interfaces between BSTO and BaM layers. Magnetization showed a large coercivity ( {approx}2000 Oe) consistent with the hexaferrite component. The hysteresis loops also revealed the distinct influence of magnetocrystalline and shape anisotropies at different temperatures.
Research Organization:
Oak Ridge National Laboratory (ORNL)
Sponsoring Organization:
SC USDOE - Office of Science (SC)
DOE Contract Number:
AC05-00OR22725
OSTI ID:
1003095
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 10 Vol. 97; ISSN 0021-8979
Country of Publication:
United States
Language:
English