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Deep x-ray lithography for micromechanics

Conference ·
OSTI ID:100026
 [1];  [2]
  1. Sandia National Labs., Albuquerque, NM (United States)
  2. Wisconsin Univ., Madison, WI (United States). Dept. of Electrical and Computer Engineering

Extensions of the German LIGA process have brought about fabrication capability suitable for cost effective production of precision engineered components. The process attributes allow fabrication of mechanical components which are not capable of being made via conventional subtractive machining methods. Two process improvements have been responsible for this extended capability which involve the areas of thick photoresist application and planarization via precision lapping. Application of low-stress x-ray photoresist has been achieved using room temperature solvent bonding of a preformed photoresist sheet. Precision diamond lapping and polishing has provided a flexible process for the planarization of a wide variety of electroplated metals in the presence of photoresist. Exposure results from the 2.5 GeV National Synchrotron Light Source storage ring at Brookhaven National Laboratory have shown that structural heights of several millimeter and above are possible. The process capabilities are also well suited for microactuator fabrication. Linear and rotational magnetic microactuators have been constructed which use coil winding technology with LIGA fabricated coil forms. Actuator output forces of 1 milliNewton have been obtained with power dissipation on the order of milliWatts. A rotational microdynamometer system which is capable of measuring torque-speed data is also discussed.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States); National Science Foundation, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
100026
Report Number(s):
SAND--95-1781C; CONF-9510205--1; ON: DE95016723; CNN: Agreement MDA972-94-3-0043; Grant DMR-88-21625
Country of Publication:
United States
Language:
English

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