Atomic oxygen flux determined by mixed-phase Ag/Ag2O deposition
Journal Article
·
· Thin Solid Films, 519(2):635-640
The flux of atomic oxygen generated in a electron cyclotron resonance (ECR) microwave plasma source was quantified by two different methods. The commonly applied approach of monitoring the frequency change of a silver-coated quartz crystal microbalance (QCM) deposition rate monitor as the silver is oxidized was found to underestimate the atomic oxygen flux by an order of magnitude compared to a more direct deposition approach. In the mixed-phase Ag/Ag2O deposition method, silver films were deposited in the presence of the plasma such that the films were partially oxidized to Ag2O; x-ray photoelectron spectroscopy (XPS) was utilized for quantification of the oxidized fraction. The inaccuracy of the QCM oxidation method was tentatively attributed to efficient catalytic recombination of O atoms on the silver surface.
- Research Organization:
- Pacific Northwest National Laboratory (PNNL), Richland, WA (US), Environmental Molecular Sciences Laboratory (EMSL)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-76RL01830
- OSTI ID:
- 1000121
- Report Number(s):
- PNNL-SA-71805; 35197; KC0203020
- Journal Information:
- Thin Solid Films, 519(2):635-640, Journal Name: Thin Solid Films, 519(2):635-640 Journal Issue: 2 Vol. 519; ISSN THSFAP; ISSN 0040-6090
- Country of Publication:
- United States
- Language:
- English
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