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Title: Electron-Cloud Build-Up Simulations for the FNAL Main Injector

Conference ·
DOI:https://doi.org/10.2172/935752· OSTI ID:948463

We present a summary on ongoing simulation results for the electron-cloud (EC) buildup in the context of the proposed FNAL Main Injector (MI) intensity upgrade effort [1]. Most of the results presented here are for the field-free region at the location of the retarding field analyzer (RFA) electron detector [2-4]. The primary input variable we exercise is the peak secondary electron yield (SEY) {delta}{sub max}, which we let vary in the range 1.2 {le} {delta}{sub max} {le} 1.7. By combining our simulated results for the electron flux at the vacuum chamber wall with the corresponding RFA measurements we infer that 1.25 {approx}< {delta}{sub max} {approx}< 1.35 at this location. From this piece of information we estimate features of the EC distribution for various fill patterns, including the average electron number density n{sub e}. We then compare the behavior of the EC for a hypothetical RF frequency f{sub RF} = 212 MHz with the current 53 MHz for a given total beam population N{sub tot}. The density n{sub e} goes through a clear threshold as a function of N{sub tot} in a field-free region. As expected, the higher frequency leads to a weaker EC effect: the threshold in N{sub tot} is a factor {approx} 2 higher for f{sub RF} = 212 MHz than for 53 MHz, and ne is correspondingly lower by a factor {approx} 2 when N{sub tot} is above threshold. We briefly describe further work that needs to be carried out, sensitivities in the calculation, and puzzles in the results that remain to be addressed.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
Accelerator& Fusion Research Division
DOE Contract Number:
DE-AC02-05CH11231
OSTI ID:
948463
Report Number(s):
LBNL-1402E; TRN: US0901655
Resource Relation:
Conference: 42nd ICFA Advanced Beam Dynamics Workshop on High-Intensity, High-Brightness Hadron Beam, Nashville, TN, Aug 25-29, 2008
Country of Publication:
United States
Language:
English

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