High temperature metallic diffraction gratings and process of manufacturing same
This invention is comprised of a method of applying diffraction gratings or images directly to the surface of a substrate wherein the gratings or images are capable of withstanding high temperatures, pressures, humidity and other such conditions related to materials testing. The method includes coating the surface of the substrate with an uniform layer of metal which is then overlaid with a layer of photo-resist material. Next, after contacting the photo-resist material with a master image containing regions of opacity and transparency, electromagnetic radiation is directed through the master image to expose the photo-resist material such that a contact print of the master image is produced on the photo-resist material. Then, after removing the master image, the photo-resist material is developed so as to remove unhardened portions thereof and leave corresponding portions of the metal layer uncovered. Finally, after removing or etching the uncovered portions of the metal layer, the remaining photo-resist material is removed to produce a metallic diffraction grating or image of predetermined size and pattern on the surface of the substrate.
- Research Organization:
- EG and G Idaho, Inc., Idaho Falls, ID (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC07-76ID01570
- Assignee:
- Dept. of Energy
- Patent Number(s):
- PATENTS-US-A8132950
- Application Number:
- ON: DE96005178; PAN: 8-132,950
- OSTI ID:
- 206455
- Resource Relation:
- Other Information: PBD: 1993
- Country of Publication:
- United States
- Language:
- English
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