Influence of substrate topography on the nucleation of diamond thin films

Conference · Tue Dec 31 00:00:00 EST 1991

OSTI ID:10135102

Dennig, P A; Stevenson, D A

Polycrystalline diamond films are of interest because of their unique materials properties. However, depositing films with the desired morphology is hindered by the difficulty in controlling the nucleation process. A popular method of enhancing the nucleation rate and density is to abrade the substrate with diamond powder before deposition. Although effective, this procedure is difficult to analyze since it may leave residual powder, may introduce damage, and may modify the surface topography. In order to separate these effects, we have studied the nucleation on chemically etched silicon substrates. Our results show that the majority of nucleation events occur on protruding surface features.

• Research Organization: Stanford Univ., CA (United States). Dept. of Materials Science and Engineering
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: FG05-88ER45345
• OSTI ID: 10135102
• Report Number(s): CONF-910854-3; ON: DE92010777
• Resource Relation: Conference: 1991 applied diamond conference,Auburn, AL (United States),20-22 Aug 1991; Other Information: PBD: [1991]
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DIAMONDS
NUCLEATION
THIN FILMS
MORPHOLOGY
SUBSTRATES
DEPOSITION
360601
360602
PREPARATION AND MANUFACTURE
STRUCTURE AND PHASE STUDIES