Fundamental studies of the chemical vapor deposition of diamond
The plasma or thermally enhanced low pressure chemical vapor deposition of diamond films is an exciting development with many challenging fundamental problems. The early stages of nucleation is relevant to the initial growth rate and the perfection and morphology of the deposit. To isolate one of the factors that influence nucleation, we have studied the effect of surface topography on the nucleation process. Our earlier work has shown preferential nucleation on sharp convex features and we have proposed several possible reasons for this behavior, including dangling bonds at the convex features. In our recent work, we have extended our investigation to include a novel patterning of silicon substrates used to pattern silicon solar cells. The results are consistent with our earlier observations that the majority of nucleation events occur on protruding surface features. In an effort to establish whether dangling bonds at the protruding surfaces may be responsible for the selective nucleation, we have evaluated the dangling bond concentration using electron spin resonance. We have carried out deposition under nominally identical surface topography, but with different concentrations of dangling bonds at or near the surface. The results of this study indicate that dangling bonds play a minor role in enhancing nucleation, in contrast to a substantial role played by special surface topographical features. In the course of the past year, we have submitted four manuscripts for publication and have made six presentations.
- Research Organization:
- Stanford Univ., CA (United States). Dept. of Materials Science and Engineering
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- FG05-88ER45345
- OSTI ID:
- 5639356
- Report Number(s):
- DOE/ER/45345-T1; ON: DE92010327
- Country of Publication:
- United States
- Language:
- English
Similar Records
Influence of substrate topography on the nucleation of diamond thin films
Influence of substrate topography on the nucleation of diamond thin films
Related Subjects
DIAMONDS
CHEMICAL VAPOR DEPOSITION
CHEMICAL BONDS
FILMS
MORPHOLOGY
NUCLEATION
PROGRESS REPORT
SILICON
SUBSTRATES
CARBON
CHEMICAL COATING
DEPOSITION
DOCUMENT TYPES
ELEMENTAL MINERALS
ELEMENTS
MINERALS
NONMETALS
SEMIMETALS
SURFACE COATING
360601* - Other Materials- Preparation & Manufacture
360602 - Other Materials- Structure & Phase Studies