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Title: Diffractive element in extreme-UV lithography condenser

Abstract

Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

Inventors:
 [1];  [2]
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  1. Albuquerque, NM
  2. Livermore, CA
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
873243
Patent Number(s):
6118577
Assignee:
Euv, L.L.C (Livermore, CA)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
diffractive; element; extreme-uv; lithography; condenser; condensers; mirror; diffraction; grating; projection; extreme; ultra-violet; significantly; enhances; critical; dimension; control; effect; smoothing; illumination; camera; entrance; pupil; minimum; light; loss; modeling; suggests; 100; nm; features; improved; extreme-uv lithography; projection lithography; entrance pupil; diffraction grating; critical dimension; diffractive element; active element; lithography condenser; extreme ultra-violet; dimension control; light loss; significantly enhances; ultra-violet significantly; enhances critical; /359/355/378/

Citation Formats

Sweatt, William C, and Ray-Chaudhurl, Avijit K. Diffractive element in extreme-UV lithography condenser. United States: N. p., 2000. Web.
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Sweatt, William C, & Ray-Chaudhurl, Avijit K. Diffractive element in extreme-UV lithography condenser. United States.
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Sweatt, William C, and Ray-Chaudhurl, Avijit K. Sat . "Diffractive element in extreme-UV lithography condenser". United States. https://www.osti.gov/servlets/purl/873243.
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@article{osti_873243,
title = {Diffractive element in extreme-UV lithography condenser},
author = {Sweatt, William C and Ray-Chaudhurl, Avijit K},
abstractNote = {Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}
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Works referenced in this record:

Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings
journal, April 1994

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