Diffractive element in extreme-UV lithography condenser
Abstract
Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.
- Inventors:
-
- Albuquerque, NM
- Livermore, CA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 873972
- Patent Number(s):
- 6285497
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- diffractive; element; extreme-uv; lithography; condenser; condensers; mirror; diffraction; grating; projection; extreme; ultra-violet; significantly; enhances; critical; dimension; control; effect; smoothing; illumination; camera; entrance; pupil; minimum; light; loss; modeling; suggests; 100; nm; features; improved; extreme-uv lithography; projection lithography; entrance pupil; diffraction grating; critical dimension; diffractive element; active element; lithography condenser; extreme ultra-violet; dimension control; light loss; significantly enhances; ultra-violet significantly; enhances critical; /359/378/355/
Citation Formats
Sweatt, William C, and Ray-Chaudhuri, Avijit. Diffractive element in extreme-UV lithography condenser. United States: N. p., 2001.
Web.
Sweatt, William C, & Ray-Chaudhuri, Avijit. Diffractive element in extreme-UV lithography condenser. United States.
Sweatt, William C, and Ray-Chaudhuri, Avijit. Mon .
"Diffractive element in extreme-UV lithography condenser". United States. https://www.osti.gov/servlets/purl/873972.
@article{osti_873972,
title = {Diffractive element in extreme-UV lithography condenser},
author = {Sweatt, William C and Ray-Chaudhuri, Avijit},
abstractNote = {Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}
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