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Title: Diffractive element in extreme-UV lithography condenser

Patent ·
OSTI ID:873972
 [1];  [2]
  1. Albuquerque, NM
  2. Livermore, CA
+ Show Author Affiliations

Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

Research Organization:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
DOE Contract Number:
AC04-94AL85000
Assignee:
EUV LLC (Santa Clara, CA)
Patent Number(s):
US 6285497
OSTI ID:
873972
Country of Publication:
United States
Language:
English

References (4)

Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings journal April 1994
Reflective systems design study for soft x-ray projection lithography journal November 1990
New optics design methodology using diffraction grating on spherical mirrors for soft x-ray projection lithography journal March 1995
EUV optical design for a 100-nm CD imaging system
  • Sweeney, Donald W.; Hudyma, Russell M.; Chapman, Henry N.
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.309559
conference June 1998

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Related Subjects

diffractive
element
extreme-uv
lithography
condenser
condensers
mirror
diffraction
grating
projection
extreme
ultra-violet
significantly
enhances
critical
dimension
control
effect
smoothing
illumination
camera
entrance
pupil
minimum
light
loss
modeling
suggests
100
nm
features
improved
extreme-uv lithography
projection lithography
entrance pupil
diffraction grating
critical dimension
diffractive element
active element
lithography condenser
extreme ultra-violet
dimension control
light loss
significantly enhances
ultra-violet significantly
enhances critical
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