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Title: Absorption induced by ionizing radiation in windows of KrF and ArF lasers

Journal Article · · Journal of Soviet Laser Research; (United States)
DOI:https://doi.org/10.1007/BF01120655· OSTI ID:5768267

Electron-beam-excited excimer lasers such as XeCl, KrF, and ArF electron-beam lasers (EBL) operating at [lambda] = 30, 248, and 193 nm respectively, are promising for the solution of many scientific and engineering problems which call for high laser-emission energies and powers. The windows of noble-gas halide EBL operate under stringent conditions. There is practically no information on the particularities of the operation of optical materials under such conditions. Continuing their earlier work, in this paper the authors report new measurements of absorption induced by IR (infrared) in windows of KrF-EBL at 248 nm. They present for the first time ever analogous data for an ArF laser at 193 nm. Windows have been tested of KU-I quartz, MgF[sub 2], and CaF[sub 2]. Experience has shown that these are the materials most widely used for KrF and ArF EBL of various types. 19 refs., 4 figs.

OSTI ID:
5768267
Journal Information:
Journal of Soviet Laser Research; (United States), Vol. 14; ISSN 0270-2010
Country of Publication:
United States
Language:
English