Comparative study of low-pressure rare-gas fluoride/chloride lasers excited by a short-pulse electron beam
Output characteristics of the short-pulse electron-beam excited ArF (193 nm), KrF (248 nm), XeF (351 nm), KrCl (222 nm), and XeCl (308 nm) lasers were experimentally investigated at the same time on the same device for various mixtures all pumped at a high excitation rate of 2.3 MW/cm/sup 3/. The optimum pressure of rare gas forming its rare-gas halide excimer increased for the sequence of ArF, KrCl, KrF, XeCl, and XeF, indicating that rare-gas halides were more quenched by the heavier rare gases, such as Xe, even at near-atmospheric pressures. At nearly atmospheric pressures the Ar-buffered mixtures gave higher laser energy than Ne-buffered mixtures except for the XeF laser. Through a series of measurements, the ArF laser showed the best result on the output energy of 96 J (5 J/l-script ) with an intrinsic efficiency of 3.4%.
- Research Organization:
- Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1, Hiyoshi, Kohoku-ku, Yokohama 223, Japan
- OSTI ID:
- 6949458
- Journal Information:
- J. Appl. Phys.; (United States), Vol. 64:4
- Country of Publication:
- United States
- Language:
- English
Similar Records
Generation of tunable short pulse VUV radiation by four-wave mixing in xenon with femtosecond KrF-excimer laser pulses
Stimulated emission from ArF(, KrCl(, KrF(, XeCl(, and XeF( molecules excited by a fast discharge
Related Subjects
EXCIMER LASERS
COMPARATIVE EVALUATIONS
PERFORMANCE
ARGON FLUORIDES
EFFICIENCY
ENERGY
EXPERIMENTAL DATA
KRYPTON CHLORIDES
KRYPTON FLUORIDES
OPTIMIZATION
PUMPING
XENON CHLORIDES
XENON FLUORIDES
ARGON COMPOUNDS
CHLORIDES
CHLORINE COMPOUNDS
DATA
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
INFORMATION
KRYPTON COMPOUNDS
LASERS
NUMERICAL DATA
RARE GAS COMPOUNDS
XENON COMPOUNDS
420300* - Engineering- Lasers- (-1989)