skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: High-power gas-discharge excimer ArF, KrCl, KrF and XeCl lasers utilising two-component gas mixtures without a buffer gas

Journal Article · · Quantum Electronics (Woodbury, N.Y.)
DOI:https://doi.org/10.1070/QEL15991· OSTI ID:22551083
;  [1];  [2]
  1. Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk (Russian Federation)
  2. Novosibirsk State University, Novosibirsk (Russian Federation)

Results of an experimental study of the influence of a gas mixture (laser active medium) composition on an output energy and total efficiency of gas-discharge excimer lasers on ArF* (193 nm), KrCl* (222 nm), KrF* (248 nm) and XeCl* (308 nm) molecules operating without a buffer gas are presented. The optimal ratios of gas components (from the viewpoint of a maximum output energy) of an active medium are found, which provide an efficient operation of laser sources. It is experimentally confirmed that for gas-discharge excimer lasers on halogenides of inert gases the presence of a buffer gas in an active medium is not a necessary condition for efficient operation. For the first time, in two-component gas mixtures of repetitively pulsed gas-discharge excimer lasers on electron transitions of excimer molecules ArF*, KrCl*, KrF* and XeCl*, the pulsed energy of laser radiation obtained under pumping by a transverse volume electric discharge in a low-pressure gas mixture without a buffer gas reached up to 170 mJ and a high pulsed output power (of up to 24 MW) was obtained at a FWHM duration of the KrF-laser pulse of 7 ns. The maximal total efficiency obtained in the experiment with two-component gas mixtures of KrF and XeCl lasers was 0.8%. (lasers)

OSTI ID:
22551083
Journal Information:
Quantum Electronics (Woodbury, N.Y.), Vol. 46, Issue 3; Other Information: Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7818
Country of Publication:
United States
Language:
English

Similar Records

Comparative study of low-pressure rare-gas fluoride/chloride lasers excited by a short-pulse electron beam
Journal Article · Mon Aug 15 00:00:00 EDT 1988 · J. Appl. Phys.; (United States) · OSTI ID:22551083

Stimulated emission from ArF(, KrCl(, KrF(, XeCl(, and XeF( molecules excited by a fast discharge
Journal Article · Sun Feb 01 00:00:00 EST 1981 · Sov. J. Quant. Electron. (Engl. Transl.); (United States) · OSTI ID:22551083

A 223-nm KrCl excimer laser on a He-Kr-HCl mixture
Journal Article · Sat Feb 28 00:00:00 EST 2004 · Quantum Electronics (Woodbury, N.Y.) · OSTI ID:22551083