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Title: Optical absorption at its onset in sputter deposited hafnia-titania nanolaminates

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3520678· OSTI ID:21537983
;  [1]
  1. Department of Chemistry and Biochemistry, University of Wisconsin-Milwaukee, P.O. Box 413, Milwaukee, Wisconsin 53201 (United States)

The onset of the fundamental optical absorption edge in sputter deposited HfO{sub 2}-TiO{sub 2} nanolaminate films grown on unheated substrates was investigated. Three bilayer architectures were examined, representing overall film chemistry from 0.51 to 0.72 atom fraction Hf. The goal was to determine the absorption coefficient, {alpha}(E), versus incident photon energy, E, and to model this dependence in terms of the absorption behavior of specific functional units within the nanolaminate. Persistence and amalgamation models were applied, representing the extremes of segregated cation and mixed cation structures, respectively, and both were found to be unsatisfactory. Consideration of physiochemical data for the nanolaminates led to the development of a modified persistence model for absorption. {alpha}(E) was decomposed into contributions from (I) broad (9 nm-thick) interfacial regions that were chiefly o-HfTiO{sub 4}, and (II) regions remote from interfaces that contained material based on a highly defective m-HfO{sub 2} lattice. The absorption edge at its onset in all nanolaminates was determined by short-range atomic order characteristic of o-HfTiO{sub 4}. An indirect band gap of E{sub G}=3.25{+-}0.02 eV was determined for this compound.

OSTI ID:
21537983
Journal Information:
Journal of Applied Physics, Vol. 108, Issue 12; Other Information: DOI: 10.1063/1.3520678; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English