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Title: RF-driven ion source with a back-streaming electron dump

Patent ·
OSTI ID:1131920
;

A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-05CH11231
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Number(s):
8,729,806
Application Number:
13/014,956
OSTI ID:
1131920
Resource Relation:
Patent File Date: 2011 Jan 27
Country of Publication:
United States
Language:
English

References (9)

Filamentless ion source for thin film processing and surface modification patent March 1993
Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber patent March 2000
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna patent February 2003
Negative ion source with external RF antenna patent February 2007
Spiral RF-Induction Antenna Based Ion Source for Neutron Generators patent-application March 2010
Radio frequency-driven proton source with a back-streaming electron dump journal February 2010
Improvement in brightness of multicusp-plasma ion source
  • Ji, Q.; Jiang, X.; King, T. -J.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 6 https://doi.org/10.1116/1.1526694
journal January 2002
Multicusp ion source with external rf antenna for production of protons journal February 2004
Experiments with planar inductive ion source meant for creation of H+ beams journal June 2007

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