Vapor Space Corrosion Testing Simulating The Environment Of Hanford Double Shell Tanks
- Savannah River Site (SRS), Aiken, SC (United States). Savannah River National Lab. (SRNL)
As part of an integrated program to better understand corrosion in the high level waste tanks, Hanford has been investigating corrosion at the liquid/air interface (LAI) and at higher areas in the tank vapor space. This current research evaluated localized corrosion in the vapor space over Hanford double shell tank simulants to assess the impact of ammonia and new minimum nitrite concentration limits, which are part of the broader corrosion chemistry limits. The findings from this study showed that the presence of ammonia gas (550 ppm) in the vapor space is sufficient to reduce corrosion over the short-term (i.e. four months) for a Hanford waste chemistry (SY102 High Nitrate). These findings are in agreement with previous studies at both Hanford and SRS which showed ammonia gas in the vapor space to be inhibitive. The presence of ammonia in electrochemical test solution, however, was insufficient to inhibit against pitting corrosion. The effect of the ammonia appears to be a function of the waste chemistry and may have more significant effects in waste with low nitrite concentrations. Since high levels of ammonia were found beneficial in previous studies, additional testing is recommended to assess the necessary minimum concentration for protection of carbon steel. The new minimum R value of 0.15 was found to be insufficient to prevent pitting corrosion in the vapor space. The pitting that occurred, however, did not progress over the four-month test. Pits appeared to stop growing, which would indicate that pitting might not progress through wall.
- Research Organization:
- Savannah River Site (SRS), Aiken, SC (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC09-08SR22470
- OSTI ID:
- 1117334
- Report Number(s):
- SRNL-STI-2013-00739; TRN: US1400287
- Country of Publication:
- United States
- Language:
- English
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