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Title: Design and fabrication of Argonne/KICP detectors for CMB polarization.

Conference · · AIP Conf. Proc. Vol. 1185
OSTI ID:979894

We present the design, microfabrication and assembly of dual-polarization absorber-coupled Transition Edge Sensor (TES) bolometer detectors for cosmic microwave background B-mode polarization studies. The device consists of two separate dies incorporating suspended silicon nitride membranes within silicon frames, carefully aligned perpendicularly and fixtured face-to-face. Polarization sensitivity around 95 GHz is provided by a single dipole-like absorber element; we briefly analyze this absorber-in-waveguide configuration in closed form using the EMF method. Proximity effect Mo/Au bilayers provide control of the TES critical temperature between 400 mK and 600 mK, with a normal resistance R{sub n} {approx} 1{Omega}. DC magnetron sputtering, wet etching, and liftoff were employed for TES fabrication. Optimization of the superconducting Mo thin film utilized independent RF bias applied to the substrate during deposition in a confocal geometry. This technique allows outstanding thin film uniformity and stress to be achieved simultaneously over a 4-inch wafer surface, leading to excellent superconducting properties. Device thermal conductance in the range from 25-250pW/K was achieved using suspended silicon nitride membranes 1 micron thick. The value of the thermal conductance depends very strongly upon the surface roughness, and therefore in turn upon the treatment of the silicon nitride material during fabrication.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC); National Science Foundation (NSF)
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
979894
Report Number(s):
ANL/MSD/CP-66875; TRN: US201011%%458
Journal Information:
AIP Conf. Proc. Vol. 1185, Journal Issue: 2009; Conference: 13th International Workshop on Low Temperature Detectors; Jul. 20, 2009 - Jul. 24, 2009; Stanford, CA
Country of Publication:
United States
Language:
ENGLISH