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Title: Surface modification of TiO{sub 2} nanoparticles for photochemical reduction of nitrobenzene.

Journal Article · · Environ. Sci. Technol.
DOI:https://doi.org/10.1021/es001109+· OSTI ID:942888

The effects of surface modification of nanocrystalline titanium dioxide (TiO{sub 2}) with specific chelating agents on photocatalytic degradation of nitrobenzene (NB) was investigated in order to design a selective and effective catalyst for removal of nitroaromatic compounds from contaminated waste streams. Mechanisms of NB adsorption and photodecomposition were investigated using infrared absorption and electron paramagnetic resonance spectroscopy. Liquid chromatography and gas chromatography/mass spectrometry were used for byproduct analyses. Arginine, lauryl sulfate, and salicylic acid were found to bind to TiO{sub 2} via their oxygen-containing functional groups. Modification of the TiO{sub 2} surface with arginine resulted in enhanced NB adsorption and photodecomposition, and compared to unmodified TiO{sub 2}. The initial quantum yield for photodegradation of NB in this system was found to be {Phi}{sub init} = 0.31 as compared to the one obtained for Degussa P25 of {Phi}{sub init} = 0.18. NB degradation followed a reductive pathway over arginine-modified TiO{sub 2} and was enhanced upon addition of methanol. No degradation of arginine was detected under the experimental conditions. Arginine improved the coupling between NB and TiO{sub 2} and facilitated the transfer of photogenerated electrons from the TiO{sub 2} conduction band to the adsorbed NB. These results indicate that surface modification of nanocrystalline TiO{sub 2} with electron-donating chelating agents is an effective route to enhance photodecomposition of nitroaromatic compounds.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOD
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
942888
Report Number(s):
ANL/CHM/JA-35646; ESTHAG; TRN: US200923%%674
Journal Information:
Environ. Sci. Technol., Vol. 34, Issue 22 ; Nov. 15, 2000; ISSN 0013-936X
Country of Publication:
United States
Language:
ENGLISH