A new Cs sputter ion source with polyatomic ion beams for SIMS applications.

Journal Article · Thu Aug 02 00:00:00 EDT 2007 · Rev. Sci. Instrum.

DOI:https://doi.org/10.1063/1.2761021· OSTI ID:917247

Belykh, S F; Palitsin, V V; Veryovkin, I V; Kovarsky, A P; Chang, R J. H.; Adriaens, A; Dowsett, M G; Adams, F

A simple design for a cesium sputter ion source compatible with vacuum and ion-optical systems as well as with electronics of the commercially available Cameca IMS-4f instrument is reported. This ion source has been tested with the cluster primary ions of Si{sub n}{sup -} and Cu{sub n}{sup -}. Our experiments with surface characterization and depth profiling conducted to date demonstrate improvements of the analytical capabilities of the secondary ion mass spectrometry instrument due to the nonadditive enhancement of secondary ion emission and shorter ion ranges of polyatomic projectiles compared to atomic ones with the same impact energy.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC); NATO; Belgian Federal Services for Scientific Technical and Cultural Affairs
• DOE Contract Number: DE-AC02-06CH11357
• OSTI ID: 917247
• Report Number(s): ANL/MSD/JA-60087; RSINAK; TRN: US200816%%362
• Journal Information: Rev. Sci. Instrum., Vol. 78, Issue Aug. 2, 2007; ISSN 0034-6748
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
CESIUM IONS
ION BEAMS
ION SOURCES
DESIGN
MASS SPECTROSCOPY
ION MICROPROBE ANALYSIS
COPPER IONS
SILICON IONS