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Title: Cathodic arcs

Cathodic arc plasma deposition has become the technology of choice for hard, wear and corrosion resistant coatings for a variety of applications. The history, basic physics of cathodic arc operation, the infamous macroparticle problem and common filter solutions, and emerging high-tech applications are briefly reviewed. Cathodic arc plasmas standout due to their high degree of ionization, with important consequences for film nucleation, growth, and efficient utilization of substrate bias. Industrial processes often use cathodic arc plasma in reactive mode. In contrast, the science of arcs has focused on the case of vacuum arcs. Future research directions include closing the knowledge gap for reactive mode, large area coating, linear sources and filters, metal plasma immersion process, with application in high-tech and biomedical fields.
Authors:
Publication Date:
OSTI Identifier:
882063
Report Number(s):
LBNL--53979
R&D Project: 81JF01; TRN: US200613%%562
DOE Contract Number:
DE-AC02-05CH11231
Resource Type:
Conference
Resource Relation:
Conference: International Joint Workshop of the Belgian andFrench Vacuum Society 'Nouvelles Tendances en Procedes Magnetron et Arcpour le Depot de Couches Minces', Gent, Belgium, November 24-25,2003
Research Org:
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
Sponsoring Org:
USDOE. National Nuclear Security Administration. Initiativesfor Proliferation Prevention
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 47 OTHER INSTRUMENTATION; 74 ATOMIC AND MOLECULAR PHYSICS; COATINGS; CORROSION; DEPOSITION; IONIZATION; MAGNETRONS; NUCLEATION; PHYSICS; PLASMA; SUBSTRATES Thin Films Plasma-Assisted Deposition