Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method

Patent · Mon Jan 01 00:00:00 EST 1996

OSTI ID:870405

Nishi, Mineo ^[1]; Makishima, Hideo ^[1]

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1. Kitakyushu, JP

A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.

• Research Organization: Battelle Memorial Institute, Columbus, OH (United States)
• DOE Contract Number: AC06-76RL01830
• Assignee: Mitsubishi Chemical Corporation (Tokyo, JP)
• Patent Number(s): US 5514526
• OSTI ID: 870405
• Country of Publication: United States
• Language: English

Related Subjects

fluorine-containing
composition
forming
anti-reflection
film
resist
surface
pattern
formation
method
comprises
aqueous
solution
water
soluble
fluorine
compound
steps
coating
photoresist
substrate
above-mentioned
exposing
coated
form
specific
developing
provided
formed
easily
removed
rinsing
alkali
according
dimensional
accuracy
anti-reflection film
water soluble
aqueous solution
photoresist composition
pattern formation
method according
forming anti-reflection
resist surface
dimensional accuracy
/430/524/