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Title: A novel electron source for EBIS machines

Conference · · AIP Conference Proceedings (American Institute of Physics); (USA)
OSTI ID:6943994
 [1]
  1. Litton Systems, Electron Devices Division, San Carlos, California 94070 (USA)

This paper describes a scheme for production of very dense rotating E-beams. Such beams appear well suited for use in electron beam ion source (EBIS) machines. The basic idea is to propagate a thick hollow beam (it can be solid) from a magnetron injection gun (MIG) through a magnetic field reversal followed by magnetic compression of the rotating beam. A small MIG systhesis program (TRMIG) was used in the preliminary design calculations and the paper will include descriptive remarks about this code. The paper includes the triple pole piece field reversal element of Scheitrum and True (1981) which has been shown to improve post-reversal beam quality.

OSTI ID:
6943994
Report Number(s):
CONF-881154-; CODEN: APCPC; TRN: 90-018075
Journal Information:
AIP Conference Proceedings (American Institute of Physics); (USA), Vol. 188:1; Conference: International symposium on electron beam ion sources and their applications, Upton, NY (USA), 14-18 Nov 1988; ISSN 0094-243X
Country of Publication:
United States
Language:
English