Electron optical properties and aberrations of a miniaturized electron beam system
- New Jersey Institute of Technology, Newark, NJ (United States)
- North Carolina State Univ., Raleigh, NC (United States)
Based on dimensional analysis, a configuration of a microlens system for focusing an electron beam can be obtained by the dimensional scaling down from a conventional lens. An electrostatic microlens system consisting of two planar microsize apertures has been investigated. For this microlens, the spherical and chromatical aberrations, the astigmatism due to elliptic distortion, and the displacement due to misalignment have been calculated in detail. The resolution has been derived by a general formula, and thus has been evaluated numerically. The computational results have shown that the miniaturized microlens system proposed in the present article possesses remarkably small aberrations and ultrahigh resolution in the low voltage operation, and will be likely applicable for some practical uses. 16 refs., 1 tab.
- OSTI ID:
- 68555
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 10, Issue 3; Other Information: PBD: May-Jun 1992
- Country of Publication:
- United States
- Language:
- English
Similar Records
Progress on PEEM3 - An Aberration Corrected X-Ray PhotoemissionElectron Microscope at the ALS
Doublet III Thomson-scattering-system hemiconcentric triplet lens